SPARROWS NEWS
  • Home
  • Latest News
  • Upcoming Events
  • Videos
  • Category
  • Contact Us
  • Author
No Result
View All Result
SPARROWS NEWS
No Result
View All Result
  • Phones
  • Events
  • Tablet
  • Wearable
  • Technology
  • REVIEW
  • Computer

ASML DUV Lithography Detailed Science: Works Faster than F1 Racing Car

by Kamlesh Bhati
August 24, 2021
ASML DUV Lithography Detailed Science
33
SHARES
Twitter

ASML DUV Lithography Detailed Science

According to ASML official science, starting from the light source, along the optical path including lighting modules, projection objective modules, and immersion lithography, in addition to the lithography machine, there is another “god”, which gathers the most important moving parts in the lithography machine, is the mechanical system ” heart” of the system, it is the wafer stage module.

RELATED POSTS

Xiaomi Surge G1 Battery Management Chip Details Explained

Qualcomm Wi-Fi 7 RF Front-end Module Announced

200MP Samsung ISOCELL HP3 Official Now with Tetra²pixel Technology

ASML DUV Lithography Detailed Science

As the most critical equipment in the chip production process of photolithography has a very high technical barrier. In such a time-critical industry as a chip, time is money. According to the official introduction of ASML, ASML has been pursuing the ultimate speed of lithography, the most advanced ASML DUV lithography machine can complete the production of 300 wafers per hour.

In other words, it takes only 12 seconds to complete a whole wafer, which also deducts the wafer exchange and positioning time, the actual lithography time to be shorter. And a wafer lithography process, the need for nearly 100 different locations on the wafer imaging circuit patterns, so the completion of 1 image cell (Field) exposure imaging is also about 0.1 seconds.

ASML DUV Lithography Detailed Science
ASML DUV Lithography

So the animation you see is actually slow motion. To achieve this imaging speed, the wafer platform is moving at a high acceleration of up to 7g. What is the concept of 7g acceleration? The F1 racing car from 0 to 100km/h acceleration takes about 2.5 seconds, while the acceleration of the wafer platform of 7g, while the acceleration from 0 to 100km/h as long as about 0.4 seconds.

ASML DUV Lithography Detailed Science
ASML DUV Lithography

The accuracy of the lithography is including the horizontal direction and vertical direction. In the horizontal direction, the chip manufacturing is stacked layer by layer upwards, up to hundreds of times stacked.

Each stacking must be perfectly overlapped with the previous one, the overlap error, called overlay precision (overlay), now the requirements have been to 1 ~ 2 nanometers. The wafer is transferred from the transfer module and placed on the wafer platform, there will be a certain mechanical error, and the error of precision machinery is micron level (1 micron = 1,000 nm), which means that each wafer on the wafer platform, there is always a shift of more than a few thousand nanometers.

How can ASML achieve 1~2 nm accuracy for each stacked lithography?

From the vertical plane, because the projection objective of the lithography is too huge, the acceptable clear image range above and below the focusing point is less than 100 nm. And from the microscopic point of view, the wafer surface is uneven, and if the height difference of the wafer platform is accumulated, the height of the photoresist at different locations on the wafer surface can vary from 500 to 1,000 nm.

These huge offsets and height differences make it necessary to do precision measurements for each wafer before each exposure, intercepting the tiny nanometer-level errors in each block of the wafer. Real-time corrections are made during the exposure phase to achieve nanometer-level accuracy.

ADVERTISEMENT
ASML DUV Lithography Detailed Science

The dual wafer platform is also developed by ASML lithography to achieve both speed and accuracy. Accurate measurement is indispensable but takes a lot of time. Dual wafer stages allow one wafer stage to be exposed to the wafer while the other stage can be measured and corrected for the next wafer. Achieving a seamless transition between measurement and exposure greatly improves production efficiency.

After ensuring speed and accuracy, the stability of the machine has to be considered.

The ASML lithography machine uses the so-called balance mass to absorb the reaction force exerted on the machine base by the balanced wafer platform, which is perfectly balanced. The entire machine is completely stationary and stable.

The lithography machine performs scanning exposure (scan) with extremely high acceleration. In less than 0.1 seconds, it has to stop and scan in the opposite direction. If such a large force is not controlled, the whole machine will vibrate. It is impossible to achieve perfect imaging. The ASML lithography machine uses the so-called balance mass to absorb the reaction force exerted by the balanced wafer platform on the base, and it is perfectly balanced. The entire machine is completely static and stable.

ASML DUV Lithography Detailed Science

The wafer has completed extremely precise measurement at the measuring end, and it needs to be perfectly positioned within a very short exposure time. This requires precise mechanical operation and real-time positioning correction. The ASML DUV lithography machine achieves 20,000 measurement corrections per second and confirms precise positioning with sensors that are accurate to 60 picometers (0.06 nanometers, smaller than a silicon atom).

ASML‘s state-of-the-art DUV lithography machine can lithograph more than 6,000 wafers per day, which means more than 600,000 round-trip scans per day. How can it operate 24 hours a day, 365 days a year, and still maintain nanometer accuracy? Won’t the wafer stage wear out? The wafer stage is moved without contact. The ASML wafer stage has two types of levitation technology, the Twinscan XT air levitation method, and the new generation Twinscan NXT magnetic levitation method. By moving without contact, ASML achieves extremely high-speed motion and long-lasting stable operation.

ASML DUV Lithography Detailed Science

ASML combines precise measurement, precision mechanics, accurate positioning, mastery of light and magnetism, and the perfect use of water to create a unique lithography machine step by step, thus allowing Moore’s Law to continue.

Source

Tags: Latest News
Tweet8ShareShare2

Related Posts

Xiaomi 12S Ultra Cooling System
Phones

Xiaomi 12S Ultra Cooling System Using New Bionic Design

July 3, 2022
Huawei XMAGE - Huawei Mobile Imaging
Phones

Huawei XMAGE is the exclusive Huawei Mobile Imaging Brand to Replace Leica

July 2, 2022
Xiaomi Surge G1 Battery Management Chip
Phones

Xiaomi Surge G1 Battery Management Chip Details Explained

July 2, 2022
Lenovo Legion with Snapdragon 8 Plus
Phones

Lenovo Legion with Snapdragon 8 Plus Appeared On TENAA With Design and Specs

July 2, 2022
Xiaomi Band 7 Pro
Wearable

Xiaomi Band 7 Pro AOD, Easy to Change Strap, And Design

July 2, 2022
Load More

REVIEWS

OPPO Find X5 Pro Review

OPPO Find X5 Pro Review: MariSilicon X Makes Sense

February 26, 2022
OnePlus 10 Pro Review

OnePlus 10 Pro Review: Subtle Polishing True Flagship

January 11, 2022
Realme GT2 Pro Review

Master-Sen Realme GT2 Pro Review

January 5, 2022
Xiaomi 12 Pro Review

Xiaomi 12 Pro Review: Experience Coexist with Performance

December 29, 2021
OPPO Find N Review

OPPO Find N Review: Reimagined Foldable Phone

December 16, 2021
Oppo Reno7 Pro Review

OPPO Reno7 Pro Review: A New Look, A Harvest Of Hearts

November 26, 2021
OnePlus 9RT Review

OnePlus 9RT Review: Impressive Battery Life and Camera with Snapdragon 888

October 24, 2021
Black Shark 4S Review

Black Shark 4S Review: In full Compliance with its Positioning

October 16, 2021

Trending Now

  • Xiaomi 12S Ultra With 23K Gold Plating; 12S Pro Official Renderings Much More
  • OPPO Watch 3 Series and OPPO Band 2 Models and Details Unveiled
  • Xiaomi Surge G1 Battery Management Chip Details Explained
  • Xiaomi 12 Lite Unboxing Video Posted in Advance
  • About Xiaomi 12S Ultra Camera: Sony IMX989 and SUMMICRON
  • Xiaomi 12S Appearance Of Pure White Unveiled

Recent Posts

  • Xiaomi 12S Ultra Cooling System Using New Bionic Design
  • Huawei XMAGE is the exclusive Huawei Mobile Imaging Brand to Replace Leica
  • Xiaomi Surge G1 Battery Management Chip Details Explained
  • Lenovo Legion with Snapdragon 8 Plus Appeared On TENAA With Design and Specs
  • Xiaomi Band 7 Pro AOD, Easy to Change Strap, And Design

Subscribe to Blog via Email

Enter your email address to subscribe to this blog and receive notifications of new posts by email.

Join 144 other subscribers

Subscribe to Newsletter via Email

Enter your email address to subscribe to this Newsletter and receive notifications of new posts by email.

SPARROWS NEWS

Your number one source for all technology and smartphone news. Dedicated to giving you the very best gadget news focus on smartphone, gadgets and technology.

© 2020 SPARROWS NEWS

  • Home
  • Latest News
  • Upcoming Events
  • Videos
  • Category
  • Contact Us
  • Author

© 2020 SPARROWS NEWS

Go to mobile version