Current EUV lithography system (NA=0.33) (front) compared to the next generation of high NA EUV lithography system (NA=0.55) (back).
Current EUV lithography system (NA=0.33) (front) compared to the next generation of high NA EUV lithography system (NA=0.55) (back).
Current EUV lithography system (NA=0.33) (front) compared to the next generation of high NA EUV lithography system (NA=0.55) (back).